Technology:
- Thin film coating, vacuum evaporation, electron beam and sputtering
- High power laser material processing
- Microwave Plasma Enhanced CVD system
- Anodic oxidation
- Diamond turning equipment for optical asphere generation
- CNC controlled precision injection molding equipment
- Electron beam litography
- Workshops: optical (staff:1), optical coating (staff:1) crystal technology (staff:1), mechanical (staff: 2), electronic (staff:1)
Characterization and Measurement:
- Surface profiling (Talysurf form test and Perthometer, optical profilometer)
- Shack-Hartmann wavefront sensor
- Optical microscopes
- Scanning electron microscope (SEM)
- Secondary Ion Mass Spectrometers (SIMS: sensitivity 0.01-1ppm, lateral resolution ~ 0.1 micrometer, depth resolution ~ 0.01 micrometer)
- Scanning Auger Microprobe (SAM: sensitivity 1 %, lateral ~ 0,5 micrometer)
- X-ray Photoelectron Spectroscope (XPS; sensitivity 0.1 %, energy resolution 0.80 eV)
- UV-vis.-near IR spectrophotometer
- Fizeau interferometer (optical shape and waveform)
- C02 (20W, tunable), Ar ion, He-Ne, Nd-YAG and diode lasers
- Visible and infrared detectors and detectors arrays (PSD, CCD)
- Electric measuring facilities (3 GHz network analyzer, 12 GHz digitizing oscilloscope)
- Impedance Spectorscopy
- Precision optical positioners
- Single mode fiber systems
- Ellipsometry
- Laser induced breakdown spectrometry
Self-developed systems:
- Acousto-optical signal processing systems (spectrum analysers)
- Differential absorption lidar
- Photoacoustic and time-resolved fluorescence and NIR spectroscopes
- Laser Doppler anemometer
- NIR spectroscope (absorption & reflection systems)
- Quadrupole mass spectrometers (QMS) for residual gas analysis
- QMS coupled DC sensor tester
- QMS plasma diagnostics with collisionless in situ sampling (IBMS)
- Load lock system between deposition and analytic facility
- Quadrupole ion trap for particle mass determination
- Time of flight mass spectrometer
- Photomodulated reflectometry
- Femtosecond laser facility
CAD and Modelling:
- Optical design and thin film softwares
- CAD for electron and ion optics
- CAD mechanical
- Computer codes for atomistic quantum mechanical simulations
- Artificial Neural Network models
- Calculations are run in 6 supercomputer centers and on high end PCs (under linux, Windows XP, Windows 7)
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